CNM W.M. KECK CLEANROOM CENTRAL USER FACILITY

The Center for Nano and Molecular Science and Technology (CNM) has a new clean room with tools for photolithography, nano-structure fabrication and testing. The clean room is located in NST 4.106. A CNM Staff attendant will be available on hand to help with clean room activities. Tooling for the clean room has been purchased that will allow users to work with samples ranging from 1"x1" to 6"/150mm in diameter. Following is a list of equipment and short description of the capabilities of each tool.

Facility Information
Training
Scheduling/Reservation
Current Fee Schedule
Operation & Equipment Status Update

Equipment Information
Suss MA-6 Mask aligner
Dektak 6M stylus profilometer
Hirox 3d video microscope
Spincoater
Critical point drier
March Plasma CS1701F RIE etching system
Ellipsometer
Fume hood

Equipment Information

Suss MA6 Mask Aligner

The mask aligner provides several modes of contact that can be selected when exposing a photoresist covered wafer to the 400nm UV light source. Contact can be light, heavy or vacuum assisted. Additionally the user may expose with no contact at all using special mask holders equipped with precision machined stand-off flags. The 350W lamp provides even illumination with computer controlled intensity modulation to produce reliable exposures. Configured for top side alignment tooling for this system has been specified as the following:

* Mask sizes from 4-7 inches
* Substrates from 1"x1" to 6"/150mm in diameter
* Substrates to .25" thickness [Go to Top]

Dektak 6M Stylus Profilometer

The Dektak 6M Bench-Top Surface Profiler measures step heights on many surfaces, with a programmable stylus force down to 1 milligram and a Z-height capability up to 1 millimeter. Its low-inertia sensor delivers extremely accurate step height, surface roughness, and waviness measurements on samples up to 6 inches. Software provided with the system allows for sophisticated numerical filtering, and statistical processing. Some capabilities of the profilometer include:

* Computer interface to control operation
* Samples to 6" diameter
* 25 micron stylus tip
* Ability to store and retrieve scan settings [Go to Top]

Hirox 3d Video Microscope

The Hirox video microscope offers many possibilities for high resolution imaging at magnifications ranging from 35x-7000x. The Hirox is a video only microscope system that can capture single image frames at high resolution. Some capabilities of the Microscope include:

Lenses and adapters with 3-D rotary head containing

* AD-5040RVS for variable angle view with magnification 50-400x
* AD-5040CS for co-axial lighting with magnification 50-400x
* AD-5040DS as diffuser for noncontact

And MX-10C coaxial zoom lens with interchangeable objective lenses with magnification ranges from 35x to 7000x, containing adapters with optical rotary and polarizer. [Go to Top]

Spincoater

Applications:

* Spin coating of polymer materials for creating metal/polymer bilayers.
* Spin coating of photoresist for patterning the photolithography process.

Specifications:

* Speed:100-8000 RPM.
* Spin time: up to 999 seconds.
* Vacuum chuck for holding samples.
* Can handle substrate sizes within a radius of 4 inch. [Go to Top]

Critical Point Drier

Critical point drying is a standard method for preparing SEM samples. Specimens are dehydrated in a solvent such as ethanol, then placed in the CPD where the solvent is exchanged with liquid carbon dioxide. Raising the temperature of the sealed "bomb" raises the liquid carbon dioxide past the critical point, where the density of the liquid phase is equal to that of the vapor phase. This process avoids the surface tension effects of normal drying and so preserves the natural structure of the sample.
Key features of the critical point drier:

* Four element stacking holder
* Optional eight element stacking holder. [Go to Top]

March Plasma CS1701F RIE etching system

* Bench top
* Florin chemistry
* Able to link consecutive process steps.
* 4 mass flow controllers for reproducible gas flow.
* Up to nine process steps can be stored and recalled. Linking steps ensures the sample under vacuum pressure, reduces the possibility of contamination.

Etch rates achievable with the system:

* Al: 1micron/min
* GaAs: 1micron/min
* TiW: 5,000 A/min
* Sio2: 3,000-7,000 A/min [Go to Top]

Ellipsometer

Capable of scanning areas ranging from 1cm2 to 6 in2 and patterns from single point scans to a 32+ point profile. Typical metrology includes:

* Resists
* Masks
* Stepper optics (coatings) Resists
* Bottom and top AR films
* Pellicles
* Immersion fluid measurements

Optical constants from 146nm to 1700nm.

Fume Hood

Safely removes hazardous fumes for safe indoor release of exhaust. [Go to Top]

Facility Information

Training:

Training classes will be scheduled for all equipment on regular basis.
For current training schedule information and to sign-up for training, Please contact Mike Tiner.
You can take training classes as you wish by paying the training fee once.
Training Request Form signed by your supervisor is required to attend training sessions. [Go to Top]

Scheduling/Reservation:

Please use the online reservation system to schedule a time for equipment use. For assistance with reservation, please contact Mike Tiner

Current Fee Schedule:

Fees will be minimal for the next two months while we work out the details of operation and establish our base of users. As always we will keep fees to the minimum required to substantially cover ongoing costs. Current fee schedule is as follows:

* Equipment Usage Fee: $10/day
* Training Fee: $40 one time charge covers all equipment
* This Fee Schedule is valid until 7/15/05 [Go to Top]

Operation and Equipment Status Update:

Although our facility is in place we might not have everything that you might find critical, we invite you to help with the finishing touches. Over the next two months, we will continue to add small items and monitor the performance of the cleanroom to ensure we have a safe and sound environment for you to use. Our goal is to make this a great place to do your research. [Go to Top]